IN SITU FORMATION AND DEPOSITION OF PALLADIUM Pd(0) IN REACTORS

The invention relates mainly to a process for the in situ generation of a catalyst (Pd(0)) and the deposition of said catalyst on the internal wall(s) of a glass, glass-ceramic or ceramic reactor. The invention further relates to a reactor, preferably a microfluidic device, as may be obtained by the...

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Bibliographic Details
Main Authors CERATO-NOYERIE, CARINE, HORN, CLEMENS, R
Format Patent
LanguageEnglish
French
Published 05.08.2010
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:The invention relates mainly to a process for the in situ generation of a catalyst (Pd(0)) and the deposition of said catalyst on the internal wall(s) of a glass, glass-ceramic or ceramic reactor. The invention further relates to a reactor, preferably a microfluidic device, as may be obtained by the in situ generation and deposition of palladium Pd(0) on its internal wall(s) carried out according to said process. The invention also globally concerns catalytic processes including said process. L'invention concerne principalement un procédé pour la génération in situ d'un catalyseur (Pd(0)) et le dépôt dudit catalyseur sur la ou les parois internes d'un réacteur en verre, vitrocéramique ou céramique. L'invention porte en outre sur un réacteur, de préférence un dispositif microfluidique, tel qu'il peut être obtenu par la génération in situ et le dépôt de palladium Pd(0) sur sa ou ses parois internes, conformément audit procédé. L'invention concerne également de façon générale des procédés catalytiques comprenant ledit procédé.
Bibliography:Application Number: WO2010US22504