A METHOD OF FORMING FRONT CONTACTS TO A SILICON SOLAR CELL WITHOUT PATTERNING

A method for forming front contacts on a silicon solar cell which includes texture etching the front surface of the solar cell, forming an antireflective layer over the face, diffusing a doping material into the face to form a heavily doped region in valleys formed during the texture-etching of the...

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Bibliographic Details
Main Authors DUKOVIC, JOHN, BORDEN, PETER, XU, LI
Format Patent
LanguageEnglish
French
Published 12.08.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A method for forming front contacts on a silicon solar cell which includes texture etching the front surface of the solar cell, forming an antireflective layer over the face, diffusing a doping material into the face to form a heavily doped region in valleys formed during the texture-etching of the face, depositing an electrically conductive material on the heavily doped regions in the valleys and annealing the solar cell. L'invention concerne un procédé de formation de contacts frontaux sur une cellule solaire en silicium qui consiste en une gravure de texture sur la surface avant de la cellule solaire, la formation d'une couche antireflets sur la face, la diffusion d'un matériau dopant dans la face pour former une zone fortement dopée dans les vallées formées pendant la gravure de texture de la face, le dépôt d'un matériau électriquement conducteur sur les zones fortement dopées dans les vallées et la recuisson de la cellule solaire.
Bibliography:Application Number: WO2009US64121