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A fluid for dispensation on a substrate. In one implementation, the fluid comprises a set of fluid parameters to facilitate dispensation of the fluid from the system. In another implementation, the fluid comprises a set of fluid parameters specific to a polymerizable material. L'invention conce...

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Bibliographic Details
Main Author TRUSKETT, VAN, N
Format Patent
LanguageEnglish
French
Published 29.04.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
NOZZLES
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Summary:A fluid for dispensation on a substrate. In one implementation, the fluid comprises a set of fluid parameters to facilitate dispensation of the fluid from the system. In another implementation, the fluid comprises a set of fluid parameters specific to a polymerizable material. L'invention concerne un système selon lequel, un liquide est distribué sur un substrat. Dans un mode de réalisation, le liquide comprend un ensemble de paramètres fluidiques dont l'objet est de faciliter la distribution du liquide à partir du système. Dans un autre mode de réalisation, le liquide comprend un ensemble de paramètres fluidiques propres à un matériau polymérisable.
Bibliography:Application Number: WO2009US05678