SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
A through electrode (16) is formed in a first substrate (11) so as to reach the rear surface thereof. A second substrate (21) is bonded to the rear surface of the first substrate (11). The second substrate (21) is electrically connected to the first substrate (11) via the through electrode (16). ...
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Main Author | |
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Format | Patent |
Language | English French Japanese |
Published |
01.04.2010
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Subjects | |
Online Access | Get full text |
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Summary: | A through electrode (16) is formed in a first substrate (11) so as to reach the rear surface thereof. A second substrate (21) is bonded to the rear surface of the first substrate (11). The second substrate (21) is electrically connected to the first substrate (11) via the through electrode (16). The side wall of the end portion of the through electrode (16) in contact with the second substrate (21) has an inclination angle greater than an inclination angle of the side wall of the other portion.
Une électrode traversante (16) est formée dans un premier substrat (11) de façon à atteindre la surface arrière de celui-ci. Un second substrat (21) est lié à la surface arrière du premier substrat (11). Le second substrat (21) est électriquement connecté au premier substrat (11) via l'électrode traversante (16). La paroi latérale de la partie extrémité de l'électrode traversante (16) en contact avec le second substrat (21) possède un angle d'inclinaison supérieur à l'angle d'inclinaison de la paroi latérale de l'autre partie. |
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Bibliography: | Application Number: WO2009JP03164 |