RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV...
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Main Authors | , , , |
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Format | Patent |
Language | English French |
Published |
18.02.2010
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Subjects | |
Online Access | Get full text |
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Summary: | A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
L'invention concerne un filtre à pureté spectrale configuré pour émettre un rayonnement ultraviolet extrême (EUV) et dévier ou absorber le rayonnement secondaire non EUV. Dans un mode de réalisation, le filtre à pureté spectrale comprend un corps de matière hautement transmissive de rayonnement EUV et une couche de matière hautement réfléchissante de rayonnement secondaire non EUV qui se trouve sur un côté du corps incident au rayonnement. Dans un mode de réalisation, le filtre à pureté spectrale comprend un corps de matière hautement transmissive de rayonnement EUV et une couche de matière hautement émissive sur une extrémité du corps. |
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Bibliography: | Application Number: WO2009EP05488 |