SYSTEMS AND METHODS FOR DETECTING DESIGN AND PROCESS DEFECTS ON A WAFER, REVIEWING DEFECTS ON A WAFER, SELECTING ONE OR MORE FEATURES WITHIN A DESIGN FOR USE AS PROCESS MONITORING FEATURES, OR SOME COMBINATION THEREOF

Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided. L'invention porte sur divers systèmes et procédés pour...

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Bibliographic Details
Main Authors SAIDIN, ZAIN, NANJANGUD, SAVITHA, EDELSTEIN, SERGIO, HESS, CARL, FOUQUET, CHRISTOPHE
Format Patent
LanguageEnglish
French
Published 17.12.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided. L'invention porte sur divers systèmes et procédés pour détecter des défauts de conception et de traitement sur une tranche, examiner des défauts sur une tranche, sélectionner une ou plusieurs caractéristiques dans une conception à utiliser en tant que caractéristiques de surveillance de traitement, ou une certaine combinaison de ces opérations.
Bibliography:Application Number: WO2009US46379