APPARATUS AND METHOD OF VAPOR COATING IN AN ELECTRONIC DEVICE

• Main Authors: FLATTERY, DAVID, K, SIMPSON, GEORGE, LANG, CHARLES, D, JOHANSSON, GARY, A, TREMEL, JAMES, DANIEL, SANT, PAUL, ANTHONY, ITTEL, STEVEN, DALE, SORICH, STEPHEN, FELDMAN, JERALD
• Format: Patent
• Language: English; French
• Published: 26.11.2009
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

An apparatus and method for vapor phase deposition of a reactive surface area (RSA) material onto a substrate of an electronic device. The vapor phase deposition is conducted at ambient pressures in air, and provides capture of residual vapor to minimize environmental release of RSA and other constituents used in the processing. L'invention porte sur un appareil et sur un procédé de revêtement en phase vapeur d'un matériau à aire de surface réactive (RSA) sur un substrat d'un dispositif électronique. Le revêtement en phase vapeur est conduit à des pressions ambiantes dans l'air et fournit une capture de vapeur résiduelle, ce qui permet de réduire la libération dans l'environnement de la RSA et d'autres constituants utilisés au cours du traitement.