REDUCING PARTICLE IMPLANTATION

Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sa...

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Main Authors NOTTE IV, JOHN V, KNIPPELMEYER, RAINER, SCIPIONI, LAWRENCE, DINATALE, BILL, ECONOMOU, NICHOLAS, STERN, LEWIS A, ANANTH, MOHAN
Format Patent
LanguageEnglish
French
Published 28.01.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface. L'invention concerne des procédés consistant à : (a) former un canal dans un échantillon, le canal étendant un ou plusieurs microns suivant une direction orientée à un angle donné par rapport à une surface de l'échantillon; (b) exposer une partie de l'échantillon au-dessus du canal à un faisceau de particules pour amener les particules à quitter la surface de l'échantillon; et (c) former une image de l'échantillon d'après les particules qui quittent la surface.
Bibliography:Application Number: WO2009US34002