FINFET WITH SEPARATE GATES AND METHOD FOR FABRICATING A FINFET WITH SEPARATE GATES

The present invention relates to a FinFET with separate gates and to a method for fabricating the same. A dielectric gate-separation layer between first and second gate electrodes has an extension in a direction pointing from a first to a second gate layer that is smaller than a lateral extension of...

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Bibliographic Details
Main Authors SURDEANU, RADU, SONSKY, JAN
Format Patent
LanguageEnglish
French
Published 20.08.2009
Subjects
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