FINFET WITH SEPARATE GATES AND METHOD FOR FABRICATING A FINFET WITH SEPARATE GATES
The present invention relates to a FinFET with separate gates and to a method for fabricating the same. A dielectric gate-separation layer between first and second gate electrodes has an extension in a direction pointing from a first to a second gate layer that is smaller than a lateral extension of...
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Main Authors | , |
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Format | Patent |
Language | English French |
Published |
20.08.2009
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Subjects | |
Online Access | Get full text |
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