PROCESS FOR PRODUCTION OF PHOTORESIST RESINS

• Main Authors: HONDA, FUMIE, YONEKURA, ISAMU, ITO, YASUHIRO, NIIMI, MASATSUGU
• Format: Patent
• Language: English; French; Japanese
• Published: 22.05.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

The invention aims at providing a process for the production of photoresist resins which brings about reduction in the quantity of a solvent used and enables efficient removal of impurities such as low-molecular components and metal components and which makes it possible to produce easily resins having narrow molecular weight distributions. The invention relates to a process for producing a photoresist resin by polymerizing a polymerizable compound in the presence of a solvent which comprises the resin solution preparation step (1) of preparing a resin solution containing a photoresist resin and the purification step (2) of purifying the solution with an ultrafiltration membrane. La présente invention concerne un procédé de production de résines photosensibles qui entraîne la réduction de la quantité de solvant utilisé et permet une élimination efficace des impuretés telles que des composants de faible poids moléculaire et des composants métalliques et qui rend possible une production aisée de résines ayant des distributions étroites de poids moléculaire. L'invention concerne un procédé de production d'une résine photosensible en polymérisant un composé polymérisable en présence d'un solvant qui comprend l'étape (1) de préparation d'une solution de résine consistant à préparer une solution de résine contenant une résine photosensible et l'étape (2) de purification consistant à purifier la solution avec une membrane d'ultrafiltration.