EXPOSURE APPARATUS AND EXPOSURE METHOD

• Main Authors: KONDOU, TOSHIYUKI, MIYAJI, TAKUYA, HAYASHI, SHINICHIRO, SAJI, NOBUHITO, TAKAGI, YOSUKE, MATSUZAKA, MASAAKI, GOTOU, TADASHI, KARUISHI, SHUSAKU
• Format: Patent
• Language: English; French; Japanese
• Published: 09.10.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

A proximity scanning exposure apparatus (1) is provided with a substrate transfer mechanism (20), which supports a substrate (W) at least in an exposure region by floating the substrate and transfers the substrate (W) in a prescribed direction; a plurality of mask holding sections (71), which respectively hold a plurality of masks (M) whereupon patterns (P) are formed, and are arranged in a staggered manner along a direction intersecting with a prescribed direction; and a plurality of irradiating sections (80), which are respectively arranged on upper portions of the mask holding sections (71), and irradiate light for exposure. Then, the substrate (W) being transferred in the prescribed direction is applied with exposure light (EL) through the masks (M), and patterns (P) of the masks (M) are exposed to the substrate (W). L'invention concerne un appareil d'exposition à balayage de proximité (1) qui comporte un mécanisme de transfert de substrat (20), qui supporte un substrat (W) au moins dans une région d'exposition par flottaison du substrat et transfert le substrat (W) dans une direction prescrite ; plusieurs sections de maintien de masque (71), qui maintiennent respectivement plusieurs masques (M) sur lesquels des motifs (P) sont formés, et qui sont disposées de façon décalée le long d'une direction coupant une direction prescrite ; et plusieurs sections d'irradiation (80), qui sont respectivement disposées sur des parties supérieures des sections de maintien de masque (71), et qui irradient de la lumière pour l'exposition. Ensuite, le substrat (W) qui est transféré dans la direction prescrite se voit appliqué une lumière d'exposition (EL) à travers les masques (M), et les motifs (P) des masques (M) sont exposés au substrat (W).