APPARATUS

Apparatus for the production of a charged particle beam, comprising: an ion source plasma chamber (104), having a door (106), and an accelerator (102) mounted on the face of the door remote from the ion source plasma chamber. Appareil pour la production d'un faisceau de particules chargées, com...

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Bibliographic Details
Main Authors HOLMES, ANDREW, JAMES, TIMOTHY, DAVIS, MERVYN, HOWARD
Format Patent
LanguageEnglish
French
Published 12.09.2008
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:Apparatus for the production of a charged particle beam, comprising: an ion source plasma chamber (104), having a door (106), and an accelerator (102) mounted on the face of the door remote from the ion source plasma chamber. Appareil pour la production d'un faisceau de particules chargées, comprenant : une chambre de plasma source ionique (104), ayant une porte (106), et un accélérateur (102) monté sur la face de la porte séparée de la chambre de plasma source ionique.
Bibliography:Application Number: WO2008GB50118