OPTICAL SYSTEM MANUFACTURING METHOD

• Main Authors: TAKITANI, TOSHIYA, MATSUMOTO, YASUHIRO, ISHIHARA, JUN, OKUMURA, YOSHIHIRO, IMAOKA, MASAYUKI, HAYASHI, KOHTARO, MASUBUCHI, TOMOKAZU
• Format: Patent
• Language: English; French; Japanese
• Published: 13.12.2007
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; CHEMISTRY; GLASS; INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; MEASURING; METALLURGY; MINERAL OR SLAG WOOL; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TESTING; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

A projection optical system (PS) manufacturing method evaluates an optical performance of an entire system from approximate planes of all the optical planes in the projection optical system (PS) and changes at least one of the approximate planes of all the optical planes (such as a reduction side lens plane (S(L2s)) of a second lens L2 of an initial article referred to as "a change approximate plane") so as to obtain a change amount of tbe change approximate plane when optimal optical performance is obtained as the entire system. According to the change amount, a correction treatment amount for the cavity plane of a metal mold corresponding to the change approximate plane is obtained to perform correction treatment, thereby manufacturing a new cavity plane. La présente invention concerne un procédé de fabrication de système optique (PS) qui évalue la performance optique de tout un système à partir de plans approchés de tous les plans optiques dans le système optique de projection (PS) et modifie au moins l'un des plans approchés de tous les plans optiques (tel un plan de lentille latéral de réduction (S(L2s) d'une seconde lentille L2 d'un article initial qualifié de 'plan approché de modification'), afin d'obtenir une quantité de modification du plan approché de modification, lorsque la performance optique est obtenue pour tout le système. Selon la quantité de modification, une quantité de traitement de correction, destinée au plan de la cavité d'un moule métallique correspondant au plan approché de modification, est obtenue afin d'effectuer un traitement de correction, ce qui permet de fabriquer un nouveau plan de cavité.