METHOD OF FORMING NANOSCALE FEATURES USING SOFT LITHOGRAPHY
The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate. La présente invent...
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Main Authors | , , , , |
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Format | Patent |
Language | English French |
Published |
18.10.2007
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Subjects | |
Online Access | Get full text |
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