METHOD OF FORMING NANOSCALE FEATURES USING SOFT LITHOGRAPHY

The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate. La présente invent...

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Bibliographic Details
Main Authors FA, KEQING, HUA, FENG, SHIM, ANNE, BOHN, PAUL, ROGERS, JOHN
Format Patent
LanguageEnglish
French
Published 18.10.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OR TREATMENT THEREOF
MATERIALS THEREFOR
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TRANSPORTING
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Summary:The present invention provides a method of forming a molecular membrane using soft lithography. The method includes forming a pattern having at least one nanoscale feature in a moldable polymer composition and deploying at least a portion of the pattern adjacent a first substrate. La présente invention concerne un procédé de production d'une membrane moléculaire au moyen d'une lithographie molle. Ce procédé consiste à produire un modèle qui présente au moins une caractéristique nanométrique dans une composition polymère pouvant être moulée, puis à déployer au moins une partie du modèle de manière adjacente à un premier substrat.
Bibliography:Application Number: WO2007US63644