EXPOSURE APPARATUS, MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

An exposure apparatus (EX) is provided with immersion systems (86, 87) and a replacing system (CS) for replacing an immersion member (70). The replacing system (CS) is provided with a holding apparatus (30) for removably holding the immersion member (70) and a transfer apparatus (50). Deterioration...

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Bibliographic Details
Main Author NISHII, YASUFUMI
Format Patent
LanguageEnglish
French
Japanese
Published 20.09.2007
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An exposure apparatus (EX) is provided with immersion systems (86, 87) and a replacing system (CS) for replacing an immersion member (70). The replacing system (CS) is provided with a holding apparatus (30) for removably holding the immersion member (70) and a transfer apparatus (50). Deterioration of the operation rate due to cleaning or replacement of the immersion member (70) is suppressed by using the replacement system (CS). La présente invention concerne un appareil d'exposition (EX) pourvu de systèmes d'immersion (86, 87) et d'un système de remplacement (CS) destiné à remplacer un élément d'immersion (70). Le système de remplacement (CS) est équipé d'un appareil de retenue (30) destiné à retenir de manière amovible l'élément d'immersion (70) et d'un appareil de transfert (50). L'utilisation de ce système de remplacement (CS) permet de supprimer la détérioration du premier régime de fonctionnement à la suite du nettoyage ou du remplacement de l'élément d'immersion (70).
Bibliography:Application Number: WO2007JP54706