METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

• Main Authors: LUDIKHUIZE, ADRIANUS, W, STRIJKER, JOAN, WICHARD, WEIJLAND, INESZ, M
• Format: Patent
• Language: English; French
• Published: 10.05.2007
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The method of the invention discloses a cheaper way of manufacturing a semiconductor device such as a lateral high voltage field-effect (HV-FET) transistor. The method comprises: a substrate of a first conductivity type (1) , - Implanting a first dopant to form a first region (2) of a second conduct...