METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT DEVICE

• Main Author: GENDA, KAZUO
• Format: Patent
• Language: English; French; Japanese
• Published: 15.03.2007
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Disclosed is a method for manufacturing an organic EL device wherein production load during formation of a protective film is decreased without lowering the protective resistance to moisture or oxygen. Specifically disclosed is a method for manufacturing an organic electroluminescent device wherein a protective film is formed over an organic electroluminescent device which is formed on a substrate. In this method, the step for forming the protective film is composed of a step (103) for forming a first protective film in a vacuum environment, and a step (104) for forming a second protective film in an atmospheric pressure environment. La présente invention concerne un dispositif de fabrication d'un dispositif EL organique dont la charge de production pendant la fabrication d'une pellicule protectrice est diminuée sans abaisser la résistance protectrice à l'humidité ou à l'oxygène. Elle concerne spécifiquement un procédé de fabrication d'un dispositif électroluminescent organique, une pellicule protectrice étant disposée sur un dispositif électroluminescent organique qui est disposé sur un substrat. Dans ce procédé, l'étape de formation de la pellicule protectrice est composée d'une étape (103) de formation d'une première pellicule protectrice dans un environnement sous vide, et d'une étape (104) de formation d'une seconde pellicule protectrice dans un environnement à pression atmosphérique.