MULTI-ZONE SHOWERHEAD FOR DRYING SINGLE SEMICONDUCTOR SUBSTRATE

A shower head processes a wafer with a plate having a plurality of nozzles positioned thereon, each of the nozzles assigned to one of a plurality of processing zones for the wafer; and a manifold assembly coupled to each of the nozzles to control one or more of the nozzles as a group in each process...

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Bibliographic Details
Main Author PHAM, XUYEN
Format Patent
LanguageEnglish
French
Published 31.05.2007
Subjects
BLASTING
DRYING
DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
HEATING
LIGHTING
MECHANICAL ENGINEERING
WEAPONS
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Summary:A shower head processes a wafer with a plate having a plurality of nozzles positioned thereon, each of the nozzles assigned to one of a plurality of processing zones for the wafer; and a manifold assembly coupled to each of the nozzles to control one or more of the nozzles as a group in each processing zone. La présente invention concerne une douchette conçue pour traiter une tranche avec une plaque dans laquelle sont positionnées plusieurs buses; chacune de ces buses étant destinée à l'une des multiples zones de la tranche; et un ensemble collecteur couplé à chacune des buses afin de commander une ou plusieurs buses de manière groupée dans chaque zone de traitement.
Bibliography:Application Number: WO2005US43795