LIQUID AND METHOD FOR REMOVING DETERIORATED LAYER OF COPPER CONTAINING COPPER OXIDE

Disclosed is a liquid composed of a monocarboxylic acid and water which is used for removing residues of a deteriorated layer of copper which is damaged by dry etching and/or ashing and includes a copper oxide. La présente invention décrit une solution composée d'un acide monocarboxylique et d&...

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Bibliographic Details
Main Authors KEZUKA, TAKEHIKO, KANEMURA, TAKASHI, ITANO, MITSUSHI, NAKAMURA, SHINGO, KAMIYA, FUMIHIRO
Format Patent
LanguageEnglish
French
Japanese
Published 23.03.2006
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Disclosed is a liquid composed of a monocarboxylic acid and water which is used for removing residues of a deteriorated layer of copper which is damaged by dry etching and/or ashing and includes a copper oxide. La présente invention décrit une solution composée d'un acide monocarboxylique et d'eau, qui est destinée à l'élimination des résidus d'une couche de cuivre détériorée, endommagée suite à gravure à sec et/ou cendrage à sec, et incluant de l'oxyde de cuivre.
Bibliography:Application Number: WO2005JP16652