ULTRA-THIN DIE AND METHOD OF FABRICATING SAME
In accordance with a specific embodiment, a method of processing a semiconductor substrate is disclosed whereby the substrate is thinned, and the dice formed on the substrate are singulated by a common process. Trench regions (42, 43) are formed on a backside of the substrate. An isotropic etch of t...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French |
Published |
16.03.2006
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Subjects | |
Online Access | Get full text |
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Summary: | In accordance with a specific embodiment, a method of processing a semiconductor substrate is disclosed whereby the substrate is thinned, and the dice formed on the substrate are singulated by a common process. Trench regions (42, 43) are formed on a backside of the substrate. An isotropic etch of the backside results in a thinning of the substrate while maintaining the depth of the trenches, thereby facilitating singulation of the die.
Selon une variante spécifique, l'invention concerne un procédé de traitement de substrat à semi-conducteurs : amincissement de substrat et formation de puce sur substrat selon une technique classique. On établit des zones de tranchées (42, 43) sur une partie arrière de substrat. Suite à une attaque isotropique de l'arrière, le substrat est aminci, mais avec maintien de la profondeur des tranchées, ce qui facilite la singulation de puce. |
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Bibliography: | Application Number: WO2005US17703 |