SUBSTRATE DOME

• Main Authors: FUSE, YUTAKA, AONAHATA, KAZUHITO, TAKIMOTO, MASAYUKI, KOMURO, HIROYUKI, ABE, TATSUMI
• Format: Patent
• Language: English; French; Japanese
• Published: 17.11.2005
• Edition: 7
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Substrate domes capable of suppressing the lowering of the accuracy of film thickness distribution on substrates disposed thereon by a thermal expansion and centrifugal force by the rotation of the substrate dome during film formation in the substrate dome. A vacuum device comprises a vacuum chamber and the substrate domes on which the film formation substrates are mounted and which are oppositely disposed at the bottom of the vacuum chamber. The substrate domes formed of titan or a titan alloy is formed in the vacuum device. Il est prévu des dômes de substrats capables de supprimer la baisse de précision de répartition d'épaisseur de film sur des substrats disposés sur celui-ci par une dilatation thermique et une force centrifuge par la rotation du dôme de substrat pendant la formation de film dans le dôme de substrat. Un dispositif d'aspiration comprend une chambre d'aspiration et les dômes de substrats sur lesquels sont montés les substrats de formation de film disposés face à face au fond de la chambre d'aspiration. Les dômes de substrats formés de titane ou d'alliage titane sont formés dans le dispositif d'aspiration.