TWO-FLUID NOZZLE FOR CLEANING SUBSTRATE AND SUBSTRATE CLEANING DEVICE

• Main Authors: SHIMOSE, SHOUICHI, SEKIGUCHI, KENJI, HIROTA, YUSAKU, KANNO, ITARU, NAGAYASU, HIROSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 15.09.2005
• Edition: 7
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING

A two-fluid nozzle for cleaning substrate adapted to mix gas and liquid in the interior and spout the liquid drops together with the gas so as to clean substrates. It is intended, in this nozzle, to make uniform the particle sizes of the liquid strops and the speed. A two-fluid nozzle for cleaning substrate comprises a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out the liquid drops formed in the interior, wherein the front end of the lead-out passage is formed with a spout port for spouting the liquid drops outside, the cross-sectional area (Sb) of the spout port is made smaller than that (Sa) of the lead-out passage, and the cross-sectional area (Sc) of the exit of the gas supply passage is made smaller than that (Sa) of the lead-out passage. Une buse deux fluides pour le nettoyage des substrats adaptée à mélanger le gaz et le liquide à l'intérieur et faire jaillir les gouttes de liquides et le gaz ensemble de manière à nettoyer les substrats. L'objectif est de rendre uniformes dans cette buse la taille et la vitesse des particules des gouttes de liquides. Une buse deux fluides pour le nettoyage de substrat comprend un passage d'alimentation de gaz pour alimenter le gaz, un passage d'alimentation de liquide pour alimenter le liquide et un passage de sortie pour amener les gouttes de liquide formées á l'intérieur, dans lequel l'extrémité avant du passage de sortie est formée avec une ouverture de jaillissement pour faire jaillir les gouttes de liquide vers l'extérieur, la zone de coupe transversale (Sb) de l'ouverture de jaillissement étant plus petite que celle (Sa) du passage de sortie et la zone de section transversale (Sc) de la sortie du passage d'alimentation de gaz est plus petite que celle (Sa) du passage de sortie.