PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART

A photosensitive polymer composition which comprises (a) a polyamide having repeating units represented by the following general formula (I): [Chemical formula (1)] (wherein U represents a tetravalent organic group; V represents a divalent organic group; and p is an integer indicating the number of...

Full description

Saved in:
Bibliographic Details
Main Authors TSUMARU, YOSHIKO, KOMATSU, HIROSHI, OOE, MASAYUKI, KAWASAKI, DAI, UENO, TAKUMI, KATOU, KOUJI
Format Patent
LanguageEnglish
French
Japanese
Published 28.07.2005
Edition7
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A photosensitive polymer composition which comprises (a) a polyamide having repeating units represented by the following general formula (I): [Chemical formula (1)] (wherein U represents a tetravalent organic group; V represents a divalent organic group; and p is an integer indicating the number of the repeating units), (b) a compound which generates an acid by the action of light, and (c) a compound represented by the following general formula (II): [Chemical formula 2] (wherein m and n each independently is 1 or 2; R's each independently represents hydrogen, alkyl, or acyl; and R and R each independently represents C1-3 fluoroalkyl). L'invention concerne une composition polymère photosensible comportant (a) un polyamide présentant des unités récurrentes de formule générale (I): où U représente un groupe organique tétravalent, V représente un groupe organique divalent, p est un entier représentant le nombre d'unités récurrentes, (b) un composé créant un acide sous l'action de la lumière et (c) un composé de formule générale (II): où m et n sont chacun indépendamment 1 ou 2; tous les R représentent chacun indépendamment hydrogène, alkyle ou acyle et R1 et R2 représentent chacun indépendamment C1-3 fluoroalkyle.
Bibliography:Application Number: WO2004JP18832