PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART
A photosensitive polymer composition which comprises (a) a polyamide having repeating units represented by the following general formula (I): [Chemical formula (1)] (wherein U represents a tetravalent organic group; V represents a divalent organic group; and p is an integer indicating the number of...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French Japanese |
Published |
28.07.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A photosensitive polymer composition which comprises (a) a polyamide having repeating units represented by the following general formula (I): [Chemical formula (1)] (wherein U represents a tetravalent organic group; V represents a divalent organic group; and p is an integer indicating the number of the repeating units), (b) a compound which generates an acid by the action of light, and (c) a compound represented by the following general formula (II): [Chemical formula 2] (wherein m and n each independently is 1 or 2; R's each independently represents hydrogen, alkyl, or acyl; and R and R each independently represents C1-3 fluoroalkyl).
L'invention concerne une composition polymère photosensible comportant (a) un polyamide présentant des unités récurrentes de formule générale (I): où U représente un groupe organique tétravalent, V représente un groupe organique divalent, p est un entier représentant le nombre d'unités récurrentes, (b) un composé créant un acide sous l'action de la lumière et (c) un composé de formule générale (II): où m et n sont chacun indépendamment 1 ou 2; tous les R représentent chacun indépendamment hydrogène, alkyle ou acyle et R1 et R2 représentent chacun indépendamment C1-3 fluoroalkyle. |
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Bibliography: | Application Number: WO2004JP18832 |