A CHEMICAL OXIDE REMOVAL (COR) PROCESSING SYSTEM AND METHOD

A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective ba...

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Bibliographic Details
Main Authors HAMELIN, THOMAS, WALLCE, JAY, LAFLAMME, ARTHUR, H. JR
Format Patent
LanguageEnglish
French
Published 07.07.2005
Edition7
Subjects
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SEMICONDUCTOR DEVICES
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Summary:A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective barrier. The second treatment chamber comprises a heat treatment chamber that provides a temperature-controlled chamber having a protective barrier. L'invention concerne un système de traitement pour la suppression d'oxyde par voie chimique. Ledit système comprend une première chambre de traitement et une seconde chambre de traitement. La première chambre de traitement comprend une chambre de traitement chimique qui constitue une chambre à température contrôlée comprenant une barrière de protection. La seconde chambre de traitement comprend une chambre de traitement thermique qui constitue une chambre à température contrôlée comprenant une barrière de protection.
Bibliography:Application Number: WO2004US37254