PHOTORESIST RESIN AND PHOTORESIST RESIN COMPOSITION

A photoresist resin comprising at least repeating unit (A) having a group which is partly detached by an acid to thereby become soluble in alkali and repeating unit (B) containing an alicyclic skeleton having a polar group, characterized in that the weight average molecular weight thereof is in the...

Full description

Saved in:
Bibliographic Details
Main Authors KISHIMURA, MASAAKI, KAMBARA, SHIGEKI
Format Patent
LanguageEnglish
French
Japanese
Published 21.04.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

Cover

More Information
Summary:A photoresist resin comprising at least repeating unit (A) having a group which is partly detached by an acid to thereby become soluble in alkali and repeating unit (B) containing an alicyclic skeleton having a polar group, characterized in that the weight average molecular weight thereof is in the range of 3000 to 15,000 and that the content of polymers whose molecular weight exceeds 40,000 is 4 wt.% or less. The molecular weight distribution (Mw/Mn) of the resin is in the range of, for example, about 1.1 to 3.0, preferably 1.5 to 2.5. L'invention concerne une résine photosensible comprenant au moins une unité de répétition (A) ayant un groupe partiellement détaché par un acide en vue de sa solubilisation dans un alcalin et une unité de répétition (B) contenant un squelette alicyclique ayant un groupe polaire, caractérisée en ce que le poids moléculaire moyen est compris entre 3000 et 15000 et que la teneur en polymères dont le poids moléculaire dépasse 40000 est de 4 % en poids au plus. La distribution du poids moléculaire (Mw/Mn) de la résine est comprise entre, par exemple, environ 1,1 et 3,0, de préférence entre 1,5 et 2,5.
Bibliography:Application Number: WO2004JP08845