SUPERCONDUCTOR AND PROCESS FOR PRODUCING THE SAME

• Main Authors: OHMATSU, KAZUYA, HAHAKURA, SHUJI
• Format: Patent
• Language: English; French; Japanese
• Published: 31.03.2005
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CABLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONDUCTORS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INSULATORS; METALLURGY; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A process for producing a superconductor in which a superconductive layer is formed on an underlying layer by repeating film deposition two or more times. Film thickness of a superconductive film formed by each deposition is set at 0.3 mum or less so that decrease in JC is small even when the thickness of the superconductive layer is large, thereby increasing IC of the superconductor. L'invention porte sur un procédé de production d'un supraconducteur selon lequel une couche supraconductrice est formée sur une couche sous-jacente en renouvelant le dépôt de film au moins deux fois. L'épaisseur d'un film supraconducteur formé par chaque dépôt est inférieure ou égale à 0,3 mu m de sorte que la réduction dans JC est faible même lorsque l'épaisseur de la couche supraconductrice est importante, ce qui augmente le circuit intégré du supraconducteur.