POSITIVE TYPE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN FROM THE SAME

• Main Authors: HAYASHI, RYOTARO, IWAI, TAKESHI, TAKESHITA, MASARU
• Format: Patent
• Language: English; French; Japanese
• Published: 13.01.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

A positive type resist composition which comprises a resin ingredient (A) which comes to have enhanced alkali solubility by the action of an acid, an acid generator ingredient (B) which generates an acid upon exposure to light, and an organic solvent (C). The ingredient (A) has (i) a structural unit (a1) which contains an acid-dissociable dissolution-inhibitive group and is derived from a (meth)acrylic ester, (ii) a structural unit (a2) which contains an acid-dissociable dissolution-inhibitive group less dissociable than the acid-dissociable dissolution-inhibitive group contained in the structural unit (a1) and is derived from a (meth)acrylic ester, and (iii) a structural unit (a3) which contains a functional lactone group and is derived from a (meth)acrylic ester. L'invention concerne une composition de réserve positive, comprenant un composant résine (A) dont la solubilité dans les alcalis est accrue sous l'action d'un acide, un composant (B) générateur d'acide qui génère un acide lorsqu'il est exposé à la lumière, et un solvant organique (C). Le composant (A) comprend (i) un motif structural (a1) qui contient un groupe inhibiteur de dissolution dissociable par l'acide, et qui est dérivé d'un ester (méth)acrylique, (ii) un motif structural (a2) qui contient un groupe inhibiteur de dissolution dissociable par l'acide, moins facilement dissociable que le groupe inhibiteur de dissolution dissociable à l'acide contenu dans le motif structural (a1), et qui est dérivé d'un ester (méth)acrylique, et (iii) un motif structural (a3) qui contient un groupe lactone fonctionnel et qui est dérivé d'un ester (méth)acrylique.