CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE

• Main Authors: JONG, LANA, I, YOKOI, SHIGERU, HUSSEIN, MAKAREM, A, WAKIYA, KAZUMASA, CLARK, SHAN, CHRISTOPHER, HARAGUCHI, TAKAYUKI
• Format: Patent
• Language: English; French
• Published: 29.12.2004
• Edition: 7
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresist film, a buried material, a metallic residue from the surface of a semiconductor substrate. L'invention porte sur une composition nettoyante contenant au moins un hydroxyde d'ammonium quaternaire, un solvant organique hydrosoluble, de l'eau, un agent anticorrosion, un hydroxyde de potassium de 1 masse en pourcentage ou moins d'une quantité totale de la solution. Cette composition nettoyante peut à elle seule ôter de manière efficace un film de photorésine, un matériau enterré, un résidu métallique de la surface d'un substrat à semi-conducteur.