REMOVER LIQUID AND REMOVING METHOD FOR ANTIREFLECTIVE FILM AND BURIED MATERIAL CONTAINING SILICON

• Main Authors: KEZUKA, TAKEHIKO, KANEMURA, TAKASHI, ITANO, MITSUSHI, NAKAMURA, SHINGO, KAMIYA, FUMIHIRO
• Format: Patent
• Language: English; French; Japanese
• Published: 23.12.2004
• Edition: 7
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

A remover liquid for removing an antireflective film and a buried material containing silicon is disclosed which contains at least one material selected from the group consisting of organic acids and organic solvents, and a hydrogen fluoride (HF). Also disclosed is a method for removing an antireflective film and/or a buried material containing silicon using such a remover liquid. L'invention concerne un liquide décapant destiné à être utilisé pour enlever un film antireflet et un matériau enterré contenant du silicium. Ce liquide contient au moins une substance choisie dans le groupe comprenant les acides organiques et les solvants organiques, ainsi qu'un fluorure d'hydrogène (FH). L'invention concerne également un procédé pour enlever un film antireflet et/ou un matériau enterré contenant du silicium au moyen du liquide décapant selon l'invention.