CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

• Main Authors: HIDESAKA, SHINICHI, MASUJIMA, MASAHIRO, MARUYAMA, KENJI, NAKAGAWA, YUSUKE, SHIMATANI, SATOSHI, NITTA, KAZUYUKI
• Format: Patent
• Language: English; French; Japanese
• Published: 02.12.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS

A chemically amplified positive photo resist composition, characterized in that it comprises (A) an alkali-soluble resin containing a hydroxystyrene based constituting unit (a1) and a styrene based constituting unit (a2), (B) crosslinking agent, (C) an acid generator and an organic solvent; and a method for forming a resist pattern which comprises using the resist composition. The photo resist composition can form a resist exhibiting high sensitivity, high heat resistance and high resolution (high contrast) and being reduced in undulation phenomenon. L'invention concerne une composition de photorésine positive amplifiée chimiquement, caractérisée en ce qu'elle comprend: A) une résine alcaline soluble contenant une unité de constitution (a1) à base d'hydroxystyrène et une unité de constitution (a2) à base de styrène, B) un agent de réticulation, C) un générateur d'acide et un solvant organique. L'invention concerne également un procédé permettant de former un motif de résine qui consiste à utiliser la composition de résine. La composition de photorésine peut former une résine possédant une sensibilité, une résistance à la chaleur et une résolution élevées (contraste élevé) et une réduction du phénomène d'ondulation.