CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

• Main Authors: KURIHARA, MASAKI, YAMAGUCHI, TOSHIHIRO, MASUJIMA, MASAHIRO, MARUYAMA, KENJI, DOI, KOSUKE, NIIKURA, SATOSHI, MIYAGI, KEN, SHIMATANI, SATOSHI, NITTA, KAZUYUKI
• Format: Patent
• Language: English; French; Japanese
• Published: 02.12.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; AUXILIARY PROCESSES IN PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHYSICS; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS

A chemically amplified positive photo resist composition which comprises an organic solvent and, dissolved therein, a resin being prepared through the reaction of a novolac resin or a hydroxystyrene resin with a crosslinking agent, being slightly soluble or insoluble in an alkaline aqueous solution and exhibiting enhanced solubility into an aqueous alkali solution in the presence of an acid, and (B) a compound generating an acid by the irradiation with a radiation, wherein it contains an acid component in a amount of 10 ppm or less. The chemically amplified positive photo resist composition can form a resist exhibiting good storage stability as a resist solution in a bottle. Cette invention concerne une composition de résine photosensible positive à amplification chimique comprenant un solvant organique et, dissoute dans ce solvant, une résine obtenue par réaction d'une résine Novolaque ou d'une résine d'hydroxystyrène avec un agent réticulant, qui est légèrement soluble ou insoluble dans une solution aqueuse alcaline en présence d'un acide, et (B) un composé qui lorsqu'il est irradié, produit un composant acide d'une teneur de 10 ppm ou moins. Cette résine photosensible positive à amplification chimique peut former une résine présentant une bonne capacité de conservation en tant que solution de résine en flacon