ETCHING LIQUID, REMOVER LIQUID AND ETCHING METHOD

• Main Authors: KEZUKA, TAKEHIKO, KANEMURA, TAKASHI, ITANO, MITSUSHI, KAMIYA, FUMIHIRO, NAKAMURA, SHINGO
• Format: Patent
• Language: English; French; Japanese
• Published: 11.11.2004
• Edition: 7
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

An etching liquid and a remover liquid for removing a resist and an organic antireflective film and/or a buried organic material are disclosed which contain at least one organic acid. L'invention concerne un liquide de gravure et un liquide décapant pour enlever une réserve et un film organique antireflet et/ou un matériau organique enfoui, qui contiennent au moins un acide organique.