DISSOLUTION RATE MODIFIERS FOR PHOTORESIST COMPOSITIONS

Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initia...

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Bibliographic Details
Main Authors DUFF, ROBERT, J, SEGER, LARRY, GOODALL, BRIAN, L, RHODES, LARRY, F, MCINTOSH, LESTER, H., III
Format Patent
LanguageEnglish
French
Published 02.09.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents. Oligomères de monomères d'oléfines polycycliques et, éventuellement, monomères allyliques ou oléfiniques, ainsi que procédé de préparation de ces oligomères, ce qui consiste à effectuer la réaction de monomères d'oléfines polycycliques en présence d'un catalyseur contenant Ni ou Pd ou, dans le cas de monomères allyliques, en présence d'un initiateur de radicaux libres. On peut introduire ces oligomères dans des compositions de résine photosensibles en tant que modificateurs de taux de dissolution. Ces compositions de résine photosensible peuvent contenir, de plus, une résine liante polymère, un générateur photoacide et des solvants.
Bibliography:Application Number: WO2004US05043