USE OF N-ALLYL SUBSTITUTED AMINES AND THEIR SALTS AS BRIGHTENING AGENTS IN NICKEL PLATING BATHS

An aqueous acidic plating bath for the electrodeposition of a nickel or nickel alloy deposit. The bath includes nickel ions and an additive having the general formula: H2C=CHCH2NR1R2 or [H2C=CHCH2N<+>R1R2R3]nX wherein R1, R2 and R3 are selected from the functional groups consisting or hydrogen...

Full description

Saved in:
Bibliographic Details
Main Author DIADDARIO, LEONARD, L., JR
Format Patent
LanguageEnglish
French
Published 20.01.2005
Edition7
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
Online AccessGet full text

Cover

More Information
Summary:An aqueous acidic plating bath for the electrodeposition of a nickel or nickel alloy deposit. The bath includes nickel ions and an additive having the general formula: H2C=CHCH2NR1R2 or [H2C=CHCH2N<+>R1R2R3]nX wherein R1, R2 and R3 are selected from the functional groups consisting or hydrogen, methyl, ethyl, propyl, allyl, propyn, propanediol and combinations thereof; and X is an n-valent inorganic or organic anion. L'invention concerne un bain galvanoplastique acide aqueux destiné à électrodéposer un dépôt de nickel ou d'alliage de nickel. Le bain comprend des ions de nickel et un additif représenté par la formule générale suivante : H2C=CHCH2NR1R2 ou [H2C=CHCH2N<+>R1R2R3]nX. Dans cette formule, R1, R2 et R3 sont choisis dans les groupes fonctionnels constitués d'hydrogène, de méthyle, d'éthyle, de propyle, d'allyle, de propyne, de propanédiol et des combinaisons de ceux-ci. X représente un anion à valence n, organique ou minéral.
Bibliography:Application Number: WO2004US03641