MASK PROCESSING DEVICE, MASK PROCESSING METHOD, PROGRAM, AND MASK

An alignment mark is produced based on design data (151) and mask characteristic data (152) showing at least the characteristics of a complementary stencil mask, a membrane shape is designed, PUF dividing and boundary processing are performed, a complementary division is effected, joining is made, a...

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Bibliographic Details
Main Authors NAKAYAMA, KOHICHI, ASHIDA, ISAO
Format Patent
LanguageEnglish
French
Japanese
Published 19.08.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An alignment mark is produced based on design data (151) and mask characteristic data (152) showing at least the characteristics of a complementary stencil mask, a membrane shape is designed, PUF dividing and boundary processing are performed, a complementary division is effected, joining is made, a complementary pattern disposition processing is performed, a pattern shape is verified, an in-membrane correction is made, a mask configuration is effected, an exposure verification is made, a mask reversion/ correction is performed, a correction result is verified, and a data conversion processing is performed to thereby generate drawn membrane data and drawn pattern data. L'invention concerne un procédé comportant les étapes consistant à : produire un repère d'alignement sur la base de données (151) de conception et de données (152) de caractéristiques de masque qui indiquent au moins les caractéristiques d'un masque lithographique complémentaire ; concevoir une forme de membrane ; mettre en oeuvre une division PUF et un traitement de frontières ; effectuer une division complémentaire ; mettre en oeuvre un assemblage ; mettre en oeuvre un traitement de mise en place de motif complémentaire ; vérifier la forme du motif ; mettre en oeuvre une correction dans la membrane ; produire une configuration de masque ; vérifier l'exposition ; inverser/corriger le masque ; vérifier le résultat de correction ; mettre en oeuvre un traitement de conversion de données afin de produire des données de membrane dessinée et des données de motif dessiné.
Bibliography:Application Number: WO2004JP01118