METHOD AND APPARATUS FOR MONITORING A MATERIAL PROCESSING SYSTEM

The present invention presents an improved apparatus and method for monitoring a material processing system, wherein the material processing system includes a processing tool, a number of RF-responsive status sensors coupled to the processing tool to generate and transmit status data, and a sensor i...

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Bibliographic Details
Main Author KLEKOTKA, JAMES, E
Format Patent
LanguageEnglish
French
Published 01.12.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention presents an improved apparatus and method for monitoring a material processing system, wherein the material processing system includes a processing tool, a number of RF-responsive status sensors coupled to the processing tool to generate and transmit status data, and a sensor interface assembly (SIA) configured to receive the status data from the plurality of RF­responsive status sensors. L'invention concerne un appareil amélioré et un procédé destinés à commander un système de traitement de matériaux, ce système de traitement de matériaux comprenant un outil de traitement, un certain nombre de capteurs d'état sensibles à la radiofréquence couplés à l'outil de traitement afin de produire et de transmettre des données d'état, ainsi qu'un ensemble de connexions de capteurs (SIA) conçu de manière à recevoir les données d'état provenant de divers capteurs d'état sensibles à la radiofréquence.
Bibliography:Application Number: WO2003IB06463