SYSTEM AND METHOD FOR DEFECT LOCALIZATION ON ELECTRICAL TEST STRUCTURES

A method and system for defect localization includes: (i) receiving a test structure (400), e.g. an integrated circuit, that includes at least one conductor (426) that is at least partially covered by an electro-optically active material (410) as to provide an indication about the electrical status...

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Bibliographic Details
Main Authors LEVIN, LIOR, TALBOT, CHRIS, ALMOGY, GILAD
Format Patent
LanguageEnglish
French
Published 24.06.2004
Edition7
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:A method and system for defect localization includes: (i) receiving a test structure (400), e.g. an integrated circuit, that includes at least one conductor (426) that is at least partially covered by an electro-optically active material (410) as to provide an indication about the electrical status of at least one or more of the conductors of the test structure; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure by optical means (430) to locate a defect. Un procédé utilisé dans un système de localisation de défauts consiste en ce qui suit: (i) recevoir une structure test qui comprend au moins un conducteur qui est au moins partiellement recouvert d'un matériau électro-optiquement actif; (ii) envoyer au conducteur un signal électrique tel qu'une charge destinée à au moins une partie du conducteur et; (iii) créer une image de la structure test pour localiser un défaut.
Bibliography:Application Number: WO2003US31398