A POLISHING PAD SUPPORT THAT IMPROVES POLISHING PERFORMANCE AND LONGEVITY

• Main Authors: THOMAS, PETER, A, OBENG, YAW, S
• Format: Patent
• Language: English; French
• Published: 25.03.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TOOLS FOR GRINDING, BUFFING, OR SHARPENING; TRANSPORTING

The present invention provides, polishing pad (230) with improved polishing properties and longevity. The pad is comprised of a thermoplastic foam substrate (240) having a surface (242) comprised of concave cells (244). A polishing agent (246) coats an interior surface (248) of the concave cells. The invention includes a method for preparing the polishing pad, and a polishing apparatus (200) comprising the polishing pad. La présente invention concerne un tampon de polissage (230) présentant des propriétés et une longévité améliorées. Ledit tampon est constitué d'un substrat de mousse thermoplastique (240) présentant une surface (242) constituée de cellules concaves (244). Un agent de polissage (246) est appliqué sur une surface intérieure (248) des cellules concaves. L'invention concerne un procédé de préparation du tampon de polissage ainsi qu'un dispositif de polissage (200) comprenant ledit tampon de polissage.