METHOD AND APPARATUS FOR SUPPORTING SEMICONDUCTOR WAFERS

• Main Author: DUBOIS, DALE, R
• Format: Patent
• Language: English; French
• Published: 27.05.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FURNACES; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; KILNS; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; OPEN SINTERING OR LIKE APPARATUS; OVENS; RETORTS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; WEAPONS

A method and system for supporting semiconductor wafers during processing. A T-shaped support, when viewed in top-down cross-section, has a relatively large, semicircular portion at one end, tapering to a series of relatively thin ledges. In side-view cross-section, the ledges are uniformly spaced along the length of the T support. The top of each ledge contacts the semicircular portion at an angle slightly greater than ninety degrees. One or more T-rails may be used in a wafer carrier. The wafer carrier typically accepts and supports one or more semiconductor wafers for thermal processing inside the process chamber, without binding the wafers or causing undue markings on the wafers' surfaces. L'invention concerne un procédé et un système destinés à supporter des plaquettes à semiconducteur au cours de leur traitement. Un support en forme de T, lorsqu'il est visualisé en section transversale de haut en bas, possède une partie semi-circulaire relativement grande au niveau d'une de ses extrémités, s'évasant en une série de rebords relativement fins. En section transversale vue de côté, les rebords sont uniformément espacés le long de la longueur du support en forme de T. Le sommet de chaque rebord entre en contact avec la partie semi-circulaire au niveau d'un angle un peu supérieur à 90 DEG . Un ou plusieurs rails en forme de T peuvent être utilisés dans un support de plaquette. Le support de plaquette permet généralement de recevoir et supporte une ou plusieurs plaquettes à semiconducteur pour le traitement thermique à l'intérieur d'une chambre de traitement, sans fixer les plaquettes ni entraîner de marques inutiles sur leurs surfaces.