RESIST FILM REMOVING APPARATUS, METHOD OF REMOVING RESIST FILM, ORGANIC MATTER REMOVING APPARATUS AND METHOD OF REMOVING ORGANIC MATTER

• Main Authors: ENDO, TAMIO, AMANO, YASUHIKO, NISHIMURA, NAOYUKI, TAMURA, TETSUJI, YOKOI, IKUNORI, OHMI, TADAHIRO, SATO, ATSUSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 23.10.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES; TRANSPORTING

A sheet feeding type resist removing apparatus, having substrate (111) being a cleaning object disposed therein and comprising treatment chamber (101) defining a closed space and spray nozzle (102) capable of spraying a cleaning liquid in the form of commonly-so-termed liquid drops over a surface of...