RESIST FILM REMOVING APPARATUS, METHOD OF REMOVING RESIST FILM, ORGANIC MATTER REMOVING APPARATUS AND METHOD OF REMOVING ORGANIC MATTER

• Main Authors: ENDO, TAMIO, AMANO, YASUHIKO, NISHIMURA, NAOYUKI, TAMURA, TETSUJI, YOKOI, IKUNORI, OHMI, TADAHIRO, SATO, ATSUSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 23.10.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES; TRANSPORTING

A sheet feeding type resist removing apparatus, having substrate (111) being a cleaning object disposed therein and comprising treatment chamber (101) defining a closed space and spray nozzle (102) capable of spraying a cleaning liquid in the form of commonly-so-termed liquid drops over a surface of substrate (111), wherein the closed space enclosing the substrate (111) in such an arrangement that the disposed substrate (111) is opposite to the spray nozzle (102) is formed by the treatment chamber (101). This construction enables forming a cleaning liquid into liquid drops in consideration of energy reduction and further desirably regulating the temperature of liquid drops at contact with the resist film in the operation of spraying a cleaning liquid over the resist film on the surface of substrate (111) to thereby remove the resist film, so that secure removal of the resist film can be accomplished. L'invention concerne un appareil de décapage de la réserve de type alimentation de feuilles, ayant un substrat (111) qui est un objet de nettoyage et comprenant une chambre de traitement (101) définissant un espace fermé et un bec pulvérisateur (102) susceptible de pulvériser un liquide de nettoyage sous la forme de gouttelettes de liquide sur une surface du substrat (111). L'espace fermé enveloppant le substrat (111) de façon que ledit substrat soit à l'opposé du bec pulvérisateur (102), est formé par la chambre de traitement (101). Cette construction permet de transformer un liquide de nettoyage en gouttelettes de liquide en tenant compte de la réduction d'énergie et, en outre, de réguler à volonté la température de ces gouttelettes au contact avec le film de la réserve lors de la pulvérisation d'un liquide de nettoyage par dessus ledit film de la surface du substrat (111) pour l'enlever, le décapage du film de la réserve pouvant donc être effectué en toute sécurité.