METHOD AND APPARATUS FOR ION BEAM COATING

• Main Authors: KITCHING, KATHRYN, J, TURECEK, FRANK, ELAM, WILLIAM, T, RATNER, BUDDY, D, LEE, HAK-NO
• Format: Patent
• Language: English; French
• Published: 28.08.2003
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method and apparatus for plasma treatment and deposition of ionized molecules on a surface an object in a vacuum. In one embodiment the apparatus comprises a vacuum system (200) having a plasma-treatment system (400) and an ion deposition system (300). L'invention porte sur un procédé et sur un appareil de traitement au plasma et de dépôt de molécules ionisées sur une surface d'un objet dans un vide. Selon une forme d'exécution, l'appareil comprend un système sous vide (200) possédant un système de traitement au plasma (400) et un système de dépôt ionique.