SURFACE-MICROMACHINED ABSOLUTE PRESSURE SENSOR AND A METHOD FOR MANUFACTURING THEREOF
The present publication discloses a capacitive pressure sensor structure, in particular for measurement of absolute pressure, and a method for manufacturing the sensor. The sensor comprises at least one fixed electrode (3), and at least one movable electrode (6, 7) electrically isolated from said fi...
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Main Author | |
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Format | Patent |
Language | English French |
Published |
16.05.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | The present publication discloses a capacitive pressure sensor structure, in particular for measurement of absolute pressure, and a method for manufacturing the sensor. The sensor comprises at least one fixed electrode (3), and at least one movable electrode (6, 7) electrically isolated from said fixed electrode (3) and spaced apaart (10) from said fixed electrode (3). According to the invention, a portion of said movable electrode (6, 7) is formed from a porous polycrystalline silicon layer (6) that in a finished component remains as an integral portion of said flexibly movable electrode (6, 7).
Cette invention concerne une structure de détecteur de pression capacitif destiné en particulier à la mesure de LA pressions absolue et son procédé de fabrication. Le détecteur comprend au moins une électrode fixe (3) et au moins une électrode mobile (6, 7) isolée électriquement de ladite électrode fixe (3) et séparée de cette dernière. Selon cette invention, une partie de l'électrode mobile (6, 7) est constituée par une couche de silicium polycristallin (6) qui, dans le composant fini, reste partie intégrante de ladite électrode mobile flexible (6, 7). |
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Bibliography: | Application Number: WO2001FI00970 |