METHOD FOR MANUFACTURING A STAMPER FOR OPTICAL DISC PRODUCTION, A STAMPER OBTAINED BY THE METHOD, AND AN OPTICAL DISC OBTAINED WITH SUCH STAMPER

Method for manufacturing a stamper for optical disc production, comprising the preparing of a substrate (1), depositing a photoresist layer (3) on the substrate, locally irradiating the photoresist layer and developing it, depositing a barrier layer (30) on the developed photoresist layer, depositin...

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Bibliographic Details
Main Authors DE HAAN, HUGO, WOUTERS, ROB, EL MAJDOUBI, HAMID
Format Patent
LanguageEnglish
French
Published 28.11.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Summary:Method for manufacturing a stamper for optical disc production, comprising the preparing of a substrate (1), depositing a photoresist layer (3) on the substrate, locally irradiating the photoresist layer and developing it, depositing a barrier layer (30) on the developed photoresist layer, depositing a first metal layer (11) on the barrier layer, depositing a second metal layer (34) on the first metal layer and separating the second metal layer, possibly keeping the first metal layer on it, from the substrate and the other layers to provide the stamper. L'invention concerne un procédé de fabrication d'une matrice destinée à une production de disques optiques. Ce procédé consiste à préparer un substrat (1), à déposer une couche de photorésine (3) sur celui-ci, à irradier localement la couche de photorésine et à la développer, à déposer une couche barrière (30) sur la couche de photorésine développée, à déposer une première couche métallique (11) sur la couche barrière, à déposer une seconde couche métallique (34) sur la première couche métallique et à séparer la seconde couche métallique, maintenant si possible la première couche métallique, du substrat et des autres couches, de manière à obtenir la matrice.
Bibliography:Application Number: WO2001NL00401