METHOD FOR PRODUCING TITANIA-DOPED FUSED SILICA EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES GLASS

• Main Authors: HRDINA, KENNETH E, MOORE, LISA A, YU, CHUNZHE C, RUSSO, NIKKI J, ACKERMAN, BRADFORD G
• Format: Patent
• Language: English; French
• Published: 07.11.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography. L'invention concerne un procédé de production de verre, consistant à mélanger un précurseur d'oxyde de titane (18) et un précurseur de silice (6) dans un collecteur (14) et à alimenter un brûleur (28) avec ledit mélange pour créer une suie (40) qui est ensuite déposée sur une surface de dépôt (34) mise en rotation et élevée. Le produit final est utile pour la lithographie par ultraviolets extrêmes.