ANTI-REFLECTIVE COATING MATERIAL, SEMICONDUCTOR PRODUCT WITH AN ARC LAYER AND METHODS

• Main Authors: GANZ, DIETMAR, HORNIG, STEFFEN
• Format: Patent
• Language: English; French
• Published: 14.11.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention refers to an anti-reflective coating (ARC) layer (2) covering a semiconductor substrate, the ARC layer being made of a matrix substance (3) and of nanocrystalline particles (4) of another material than the matrix substance. According to the invention the nanocrystalline particles (4) are absorbing light via the quantum size effect. Thereby a new kind of ARC layer, in particular absorbing ARC layer, is provided. La présente invention concerne une couche antireflet (2) recouvrant un substrat semiconducteur, laquelle couche antireflet est réalisée dans une substance matricielle (3) et dans des particules nanocristallines (4) d'une autre matière que la substance matricielle. Selon l'invention, les particules nanocristallines (4) absorbent la lumière par un effet de taille quantique. L'invention offre de cette manière un nouveau type de couche antireflet, en particulier de couche antireflet absorbante.