RESIST COMPOSITION

• Main Authors: TAKEBE, YOKO, KODAMA, SYUN-ICHI, KANEKO, ISAMU
• Format: Patent
• Language: English; French; Japanese
• Published: 27.12.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS

A chemical amplification type resist composition which is excellent especially in transparency to light beams and dry etching resistance and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. The resist composition is characterized by comprising: (A) a fluoropolymer having repeating units which have a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene and in which the monoene moieties each has a blocked acid group capable of regenerating the acid group by the action of an acid; (B) an acid-generating compound which generates an acid upon irradiation with light; and (C) an organic solvent. La présente invention concerne une composition de réserve de type amplification chimique qui a notamment d'excellentes transparence aux faisceaux lumineux et résistance à la gravure sèche, et qui a des propriétés de réserve correspondant à d'excellentes sensibilité, résolution, planéité, résistance à la chaleur, etc. La composition de réserve se caractérise en ce qu'elle comprend: (A) un fluoropolymère présentant des unités récurrentes qui ont une structure formée la cyclopolymérisation d'une molécule de diène fluoré et d'une molécule de monoène, chaque fragment monoène présentant un groupe acide bloqué capable de régénérer un groupe acide par action d'un acide; (B) un composé de production d'acide qui produit un acide lorsqu'il est exposé à la lumière; et (C) un solvant organique.