THINNER FOR RINSING PHOTORESIST AND METHOD OF TREATING PHOTORESIST LAYER

• Main Authors: LEE, YU-KYUNG, OH, SAE-TAE, JU, JIN-HO, PARK, HONG-SICK, KANG, SUNGUL, KANG, DOEK-MAN
• Format: Patent
• Language: English; French
• Published: 05.07.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A thinner for rinsing photoresist including 50 to 80 wt.% of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability. L'invention porte sur un diluant utilisé dans le rinçage d'une photorésine et comprenant 50 à 80 % en poids de n-butyl acétate, alkyl éther de propylène glycol et alkyl éther acétate de propylène glycol. Le diluant n'est ni toxique pour l'homme, ni nocif pour l'environnement et n'as pas d'odeur désagréable. La manipulation des solutions résiduaires du diluant et de l'eau résiduaire ne présente aucune complication de sorte que le diluant respecte l'environnement. Le diluant de la photorésine de cette invention a une excellente capacité de rinçage.