Lithographic apparatus and an object positioning system

• Main Authors: Overkamp, Jim Vincent, Laurent, Thibault Simon Mathieu, Berendsen, Christianus Wilhelmus Johannes, Kunnen, Johan Gertrudis Cornelis, Koevoets, Adrianus Hendrik, Renders, Michael Johannes Hendrika Wilhelmina, Saputra, Putra, Neefs, Patricius Jacobus, Cortie, Rogier Hendrikus Magdalena, Bloks, Ruud Hendrikus Martinus Johannes
• Format: Patent
• Language: English
• Published: 19.07.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to provide a pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.